СИНТЕЗ ФОТОЧУВСТВИТЕЛЬНЫХ СОПОЛИМЕРОВ НА ОСНОВЕ ГЛИЦИДИЛМЕТАКРИЛАТА И α-МЕТИЛСТИРОЛА

Abstract

Binary radical copolymerization of glycidyl methacrylate with α-methylstyrene was carried out. It is shown that the copolymerization of monomers proceeds with the opening of the double bond of the vinyl group of glycidyl methacrylate and α-methylstyrene. Copolymerization constants (r1=0.62; r2=0.35) were determined and the activity factor (Q1=0.85; Q2=0.98) and polarity (e1=0.10; e2=-1.27) of the used monomers were calculated, and it was revealed that the activity during copolymerization of glycidyl methacrylate is higher than у α-methylstyrene. Calculated microstructure parameters of calculated copolymers. It is established that the synthesized samples of copolymers are easily structured under the influence of UV rays and form negative type resists under the influence of UV rays. The determined index of photosensitivity of the copolymer (Ψ=50 cm2/С). It has been established that the high heat resistance and high physical and mechanical properties of copolymers are due to the interaction of functional groups of macromolecules, and with an increase in the number of glycidyl methacrylate units in the composition of the copolymer, the adhesive ability of the copolymer increases and, depending on the composition, the adhesive strength of the copolymer varies in the range of 9-13 MPa. As a result of the studies, it is confirmed that the samples of the copolymer are deformed without the formation of cracks during compression at a temperature of ~30-40°C. The obtained copolymer has greater flexibility, impact viscosity and ability to deform than polystyrene. Since the copolymer obtained on the basis of glycidyl methacrylate with α-methylstyrene is sensitive to light and the flow of electrons, it can be used as a negative resist in microelectronics, lithography, etc.